The Renatech dépôts 2022 network days took place on 12 and 13 October at the Insa Rennes, on the sites of the FOTON Institute and the IETR of the NanoRennes platform. During these meetings, oral presentations ( in particular from industrialists) followed one another and there was time for exchanges with all the participants on different themes : a focus on SiO2 (elaboration techniques, comparison of massive/thin layer, characterisation), different recent deposition techniques, process optimisation, layer characterisation... These days destined for the professionals of the network gathered about fifty people.
The members of the organizing committee :
- Xavier Lafosse (C2N)
- Antonin Moreau (Fresnel Institute)
- Rozenn Gautheron-Bernard (Institut FOTON)
- Christophe Levallois (Institut FOTON)
- Maxime Harnois (IETR)
